Artículos Relacionados con Kirin

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SemiAnalysis Dissects Huawei's Kirin 9030: Process Technology Halted, So They Folded the Chip

SemiAnalysis has published a detailed teardown report on the HiSilicon Kirin 9030 Pro chipset found in Huawei's Mate 80 Pro. Fabricated using SMIC's most advanced N+3 node without EUV lithography, the analysis reveals significant technical achievements and strategic shifts. The report indicates SMIC's N+3 has achieved transistor density comparable to TSMC's N6 (113.4 vs 107.7 MTr/mm²), primarily through aggressive use of Self-Aligned Quadruple Patterning (SAQP) for its metal layers. This results in a notably small 32.5nm M0 metal pitch. However, SemiAnalysis notes this achievement comes with significantly higher process complexity, cost, and potential yield challenges compared to competitors using more advanced tools. The Kirin 9030 design maximizes this constrained density. While its GPU performance has improved ~70% and matches Qualcomm's 2022 flagship level, the CPU core's IPC lags behind current top-tier designs from Apple and Qualcomm, a gap attributed to the underlying manufacturing technology rather than design capability. Facing long-term restrictions on advanced tools, Huawei is charting a new path. The report highlights the company's "LogicFolding" roadmap, a 3D stacking technique aimed at shortening signal paths to boost performance and efficiency. The goal is to reach 5GHz frequency and a projected density of 295 MTr/mm² by 2031. SemiAnalysis concludes that export controls have not halted China's chip progress but have fundamentally altered its trajectory, making it more expensive and complex. This has spurred innovation in alternative areas like 3D stacking and domestic EDA tool development, with Huawei's supply chain also beginning to integrate Chinese memory from CXMT.

marsbit06/15 06:52

SemiAnalysis Dissects Huawei's Kirin 9030: Process Technology Halted, So They Folded the Chip

marsbit06/15 06:52

τ Scaling: Huawei's New Growth Engine Designed for the Post-Moore Era

**Tau Scaling: Huawei's New Growth Engine for the Post-Moore Era** For 60 years, progress in semiconductors was driven by Moore's Law – making transistors smaller, denser, and cheaper. This path has now stalled due to plummeting returns below 7nm, astronomical lithography costs, and rising per-transistor expenses. After six years and testing 381 production chips, Huawei’s semiconductor team proposes a fundamental shift: **stop competing on size, start competing on time**. This is the core of their "τ (Tau) Scaling" theory. It treats *time* as the key optimization metric, compressing characteristic delays (τ) across all levels – from transistor switching (picoseconds) to data center tasks (seconds), spanning 12 orders of magnitude. **What is τ Scaling?** It holistically minimizes delay/time constants (τ) across four layers: transistors (switching speed), circuits (signal delay), chips (compute/memory access), and systems (end-to-end communication). The goal is to align optimization from process and circuit design to architecture and systems using this unified metric. **Mobile Application: LogicFolding** Without advancing the process node, this technique vertically stacks chips using ultra-precision hybrid bonding, distributing critical paths across layers ("stacking floors"). Results include a 55% transistor density increase, 41% better energy efficiency, over 40% higher SRAM frequency, and a roadmap targeting 4GHz by 2029. **AI Data Center Application: Full-Link Latency Compression** With 80% of AI cluster energy and 70% cost spent on data movement, the focus is slashing communication time. Key innovations include: 1. **Unified Bus:** Cuts multi-layer protocols, reducing remote access latency from microseconds to ~100 nanoseconds – 500x faster. 2. **Hi-ONE Optical Interconnect:** Replaces copper with fiber, enabling 8Tb/s per module and scaling distances from 1m to 100m for 10,000-chip clusters. 3. **3D Folding:** Solves the "interface bottleneck" of 2.5D packaging by vertically integrating memory, power, and optical I/O alongside compute, predicting over 100x integration density gain by 2035. **Re-fusion of Logic and Memory** The AI era, where data movement is more critical than computation, demands tight 3D integration of logic and memory, shifting industry influence towards memory and advanced packaging. **Remaining Challenges** include adapting EDA tools for 3D design, optimizing wafer-to-wafer process variation and vertical interconnect losses, and establishing new energy efficiency and benchmarking standards. **Conclusion:** The era of scaling physical dimensions is over. The era of scaling time has begun. By leveraging 3D stacking, system architecture, and interconnect optimization—rather than solely chasing advanced lithography—performance and efficiency can continue to advance. This is poised to be the semiconductor industry's core roadmap for the next decade.

marsbit05/25 05:35

τ Scaling: Huawei's New Growth Engine Designed for the Post-Moore Era

marsbit05/25 05:35

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